Min Li, Bingliang Gao, Wenting Chen, Chengyuan Liu, Zhaowen Wang, Zhongning Shi, Xianwei Hu, Electrodeposition behavior of aluminum from urea-acetamide-lithium halide low-temperature molten salts
点击次数：
发表刊物：Electrochimica Acta
卷号：2015, 185,
页面范围：148-155
是否译文：否
上一条：Min Li, Zhaowen Wang, Ramana G. Reddy, Cobalt electrodeposition using urea and choline chloride
下一条：Min Li, Bingliang Gao, Chengyuan Liu, Wenting Chen, Zhongning Shi, Xianwei Hu, Zhaowen Wang, Electrodeposition of aluminum from AlCl3/acetamide eutectic solvent
